Park NX-Wafer
Industry’s Leading Automated AFM for In-line Metrology Solutions

Park NX-Wafer is the leading automated AFM system in the semiconductor industry. It offers comprehensive wafer fab inspection, defect review, and CMP profiling. Park NX-Wafer boasts the highest nanoscale surface resolution, consistent sub-angstrom height accuracy, and superior tip sharpness with minimal variation. Its features like auto tip exchange, live monitoring, markless target positioning, and automated analysis, make it a top-tier tool for semiconductor wafer applications.

Park NX-Mask
An AFM-based Mask Repair and More

Revolutionizing photomask repair, the Park NX-Mask system addresses the challenges of shrinking device sizes and increasing photomask complexity with its advanced AFM technology. It precisely removes defects without the damage risks associated with E-beam or laser systems, maintaining the integrity of the reflective surface and patterns. With a unique depth control of ±7.5 µm, NX-Mask efficiently handles various defect types and integrates smoothly into in-line processes for quick repairs.