Welcome to the 2024 Next Generation Lithography + Patterning Conference!

Dear Colleagues,

We are delighted to extend our invitation to the 2024 Next Generation Lithography + Patterning Conference, scheduled to take place at the Suwon Convention Center from August 12th (Mon.) to 13th (Tue).

As the semiconductor industry continues to evolve and innovate, lithography and patterning technologies remain at the forefront of these advancements. This year's conference promises to be an invaluable opportunity for industry leaders, researchers, and academics to convene and exchange insights on the latest developments in these critical areas.

Building upon the success of previous years, we have expanded our program to include a new session on 'Advanced Etch Technology for Nanopatterning,' reflecting the growing importance of this field in semiconductor fabrication.

In addition to our plenary/keynote talks and technical/panel-discussion sessions, attendees can look forward to engaging poster presentations, networking opportunities, and interactions with industry partners and vendors. We believe that these interactions will foster collaboration, inspire innovation, and drive the continued progress of the semiconductor industry.

Once again, the Suwon Convention Center will serve as our venue, offering a convenient and conducive environment for meaningful discussions and networking. Situated adjacent to the scenic Gwanggyo Lake Park and surrounded by Suwon's iconic landmarks, the venue provides the perfect backdrop for our conference.

We eagerly anticipate your participation in this year's event as we collectively shape the future of lithography and patterning technologies through collaboration and ingenuity.

Warm regards,

2024 Conference Organizing Committee Chair Jong-Rak Park, Jinho Ahn
Program Committee Chair Byoung-Ho Lee, Jun Ho Lee