| 1st Day | Aug. 12, 2024 (Mon.)
401/402
10:45~12:15 KST
Chair: 이상설 (포스텍)
EU-I-1
EUV Mask Inspection Technologies for DRAM and Logic EUV Lithography
*민철기 (삼성전자)
Abstract
10:45~11:15
EU-I-2
Development Of High-Brightness Xe LPP Source And Its Application
*이동근 (ESOL)
Abstract
11:15~11:45
EU-I-3
Next-generation science and technology in EUV source
*김동언 (포스텍)
Abstract
11:45~12:15
