| 1st Day | Aug. 12, 2024 (Mon.)
401/402
13:30-15:00 KST
Chair: 김병국 (ESOL)
EU-II-1
High-NA EUV lithography and its challenge on depth of focus
*김황범 (SK hynix)
Abstract
13:30~14:00
EU-II-2
Challenges of EUV Blankmask Technology in High NA EUV Lithography
*승병훈 (S&S TECH)
Abstract
14:00~14:30
EU-II-3
EUV 포토마스크용 LTEM 소재
*김형준 (한국세라믹기술원, KICET)
Abstract
14:30~15:00
