| 2nd Day | Aug. 13, 2024 (Tue.)
PM-I
Patterning Materials-I
401/402
13:30~15:00 KST
좌장: 허수미 (전남대)
PM-I-1
Leveraging the strenghths of cyclic siloxane molecules and overcoming its weakness through the invention of a novel cyclic stannoxane molecule for EUV inorganic resist
*정현담 (전남대)
Abstract
13:30~14:00
PM-I-2
W-curve method to define photoresist resolution in EUV lithography
*서용범 (삼성전자)
Abstract
14:00~14:30
PM-I-3
Radical-driven Sensitivity Improvement of Tin-oxo Clusters for High NA extreme UV Lithography
*구예진 (인하대)
Abstract
14:30~14:45
PM-I-4
Advancing High-Resolution VIA Pattern through DSA and EUVL Integration
*윤세현 (전남대)
Abstract
14:45~15:00
