| 2nd Day | Aug. 13, 2024 (Tue.)
PM-II
Patterning Materials-II
401/402
15:20~16:50 KST
좌장: 고차원 (연세대)
PM-II-1
Multinuclear Tin-based Macrocyclic Organometallic Resist for EUV Photolithography
*윤효재 (고려대)
Abstract
15:20~15:50
PM-II-2
Sensitivity Enhancement of EUV Lithographic Patterning Using Tin-Containing Underlayer Materials
*이진균 (인하대)
Abstract
15:50~16:20
PM-II-3
Simulation Approaches for Exploring Process Conditions and Materials in EUV Lithography
*김현석 (전남대)
Abstract
16:20~16:50
